Spin transport and accumulation in n +-Si using Heusler compound Co2FeSi/MgO tunnel contacts

Mizue Ishikawa, Hideyuki Sugiyama, Tomoaki Inokuchi, Kohei Hamaya, Yoshiaki Saito

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22 Citations (Scopus)


We investigate spin transport and accumulation in n+-Si using Heusler compound Co2FeSi/MgO/Si on insulator (SOI) devices. The magnitudes of the non-local four- and three-terminal Hanle effect signals when using Heusler compound Co2FeSi/MgO/SOI devices are larger than when using CoFe/MgO/SOI devices, whereas the preparation methods of MgO layers on SOI are exactly same in both devices. Different bias voltage dependencies on the magnitude of spin accumulation signals are also observed between these devices. Especially, Co2FeSi/MgO/SOI devices show large spin accumulation signals compared with CoFe/MgO/SOI devices in the low bias voltage region less than ∼1000mV in which the increase of the spin polarization is expected from the estimation of the density of states in Heusler compound Co2FeSi and CoFe under spin extraction conditions. These results indicate that the species of ferromagnetic material definitely affects the magnitude and behavior of the spin signals. The use of highly polarized ferromagnets such as Heusler compounds would be important for improving the spin polarization and the magnitude of spin signals through Si channels.

Original languageEnglish
Article number092402
JournalApplied Physics Letters
Issue number9
Publication statusPublished - 31 Aug 2015
Externally publishedYes


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