Preparation of (001)c-oriented epitaxial (K, Na)NbO3 thick films by repeated hydrothermal deposition technique

Takahisa Shiraishi, Yoshiharu Ito, Mutsuo Ishikawa, Hiroshi Uchida, Takanori Kiguchi, Minoru K. Kurosawa, Hiroshi Funakubo, Toyohiko J. Konno

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10 Citations (Scopus)


(001)c-oriented (K0.86Na0.14)NbO3 thick films were prepared at 240°C on (100)cSrRuO3//(100)SrTiO3 substrates by repeated hydrothermal deposition technique. The film thickness was found to increase linearly with the number of deposition cycles, and 60 ¯m-thick film was obtained after nine repetitions of the deposition. The K/(K+Na) ratio of the deposited thick films, measured by X-ray fluorescence spectroscopy, showed constant values regardless of the number of deposition cycles. Cross-sectional scanning electron microscopy images revealed uniformity of the obtained dense films with no obvious micro cracks and pores. Structural characterization based on X-ray diffraction, XRD 2ª-½ patterns and X-ray pole figure measurement, showed that the epitaxial relationship between the films and substrates with a (001)c orientation was maintained throughout the deposition cycles. In addition, cross-sectional Raman spectra showed that 60 ¯m-thick (K0.86Na0.14)NbO3 film had an orthorhombic structure. The dielectric constant, ¾r, and tan ¤ showed frequency dependence.

Original languageEnglish
Pages (from-to)281-285
Number of pages5
JournalJournal of the Ceramic Society of Japan
Issue number5
Publication statusPublished - May 2018
Externally publishedYes


  • (K
  • Epitaxial growth
  • Hydrothermal method
  • Low-temperature deposition
  • Na)NbO3 film
  • Thick film


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