Preparation of (001)c-oriented epitaxial (K, Na)NbO3 thick films by repeated hydrothermal deposition technique

Takahisa Shiraishi, Yoshiharu Ito, Mutsuo Ishikawa, Hiroshi Uchida, Takanori Kiguchi, Minoru K. Kurosawa, Hiroshi Funakubo, Toyohiko J. Konno

Research output: Contribution to journalArticlepeer-review

10 Citations (Scopus)

Abstract

(001)c-oriented (K0.86Na0.14)NbO3 thick films were prepared at 240°C on (100)cSrRuO3//(100)SrTiO3 substrates by repeated hydrothermal deposition technique. The film thickness was found to increase linearly with the number of deposition cycles, and 60 ¯m-thick film was obtained after nine repetitions of the deposition. The K/(K+Na) ratio of the deposited thick films, measured by X-ray fluorescence spectroscopy, showed constant values regardless of the number of deposition cycles. Cross-sectional scanning electron microscopy images revealed uniformity of the obtained dense films with no obvious micro cracks and pores. Structural characterization based on X-ray diffraction, XRD 2ª-½ patterns and X-ray pole figure measurement, showed that the epitaxial relationship between the films and substrates with a (001)c orientation was maintained throughout the deposition cycles. In addition, cross-sectional Raman spectra showed that 60 ¯m-thick (K0.86Na0.14)NbO3 film had an orthorhombic structure. The dielectric constant, ¾r, and tan ¤ showed frequency dependence.

Original languageEnglish
Pages (from-to)281-285
Number of pages5
JournalJournal of the Ceramic Society of Japan
Volume126
Issue number5
DOIs
Publication statusPublished - May 2018
Externally publishedYes

Keywords

  • (K
  • Epitaxial growth
  • Hydrothermal method
  • Low-temperature deposition
  • Na)NbO3 film
  • Thick film

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