(Fe,Mn)3O4 nanochannels fabricated by AFM local-oxidation nanolithography using Mo/poly(methyl methacrylate) nanomasks

Luca Pellegrino; Yoshihiko Yanagisawa; Mizue Ishikawa; Takuya Matsumoto; Hidekazu Tanaka; Tomoji Kawai

doi:10.1002/adma.200600997

(Fe,Mn)₃O₄ nanochannels fabricated by AFM local-oxidation nanolithography using Mo/poly(methyl methacrylate) nanomasks

Luca Pellegrino, Yoshihiko Yanagisawa, Mizue Ishikawa, Takuya Matsumoto, Hidekazu Tanaka, Tomoji Kawai

Research output: Contribution to journal › Article › peer-review

35 Citations (Scopus)

Abstract

A novel method to fabricate (Fe,Mn)₃O₄ (FMO) thin-film epitaxial nanostructures employing atomic force microscopy (AFM)-fabricated Mo/poly(methyl methacrylate) (PMMA) nanomasks and wet chemical etching, is discussed. Nanomasks were realized by combining local anodic oxidation (LAO) of Mo and dry etching of PMMA. Nanostructures with dimensions of 100 nm can be easily fabricated with this technique, and the nanomask can be removed by ultrasonication in acetone. FMO nanochannels show transport properties similar to those of films, which exhibit room-temperature ferromagnetism and present the possibility of fabricating spin-polarized nanometer-scale circuits for spintronics. Nanogap electrodes can be fabricated on prepared nanochannels by Mo/PMMA masks using lift-off procedures, or the magnitude nanochannels themselves can be realized by wet etching through Mo/PMMA masks realized on metallic nanogap-electrode templates.

Original language	English
Pages (from-to)	3099-3104
Number of pages	6
Journal	Advanced Materials
Volume	18
Issue number	23
DOIs	https://doi.org/10.1002/adma.200600997
Publication status	Published - 4 Dec 2006
Externally published	Yes

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title = "(Fe,Mn)3O4 nanochannels fabricated by AFM local-oxidation nanolithography using Mo/poly(methyl methacrylate) nanomasks",

abstract = "A novel method to fabricate (Fe,Mn)3O4 (FMO) thin-film epitaxial nanostructures employing atomic force microscopy (AFM)-fabricated Mo/poly(methyl methacrylate) (PMMA) nanomasks and wet chemical etching, is discussed. Nanomasks were realized by combining local anodic oxidation (LAO) of Mo and dry etching of PMMA. Nanostructures with dimensions of 100 nm can be easily fabricated with this technique, and the nanomask can be removed by ultrasonication in acetone. FMO nanochannels show transport properties similar to those of films, which exhibit room-temperature ferromagnetism and present the possibility of fabricating spin-polarized nanometer-scale circuits for spintronics. Nanogap electrodes can be fabricated on prepared nanochannels by Mo/PMMA masks using lift-off procedures, or the magnitude nanochannels themselves can be realized by wet etching through Mo/PMMA masks realized on metallic nanogap-electrode templates.",

author = "Luca Pellegrino and Yoshihiko Yanagisawa and Mizue Ishikawa and Takuya Matsumoto and Hidekazu Tanaka and Tomoji Kawai",

year = "2006",

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doi = "10.1002/adma.200600997",

language = "English",

volume = "18",

pages = "3099--3104",

journal = "Advanced Materials",

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T1 - (Fe,Mn)3O4 nanochannels fabricated by AFM local-oxidation nanolithography using Mo/poly(methyl methacrylate) nanomasks

AU - Pellegrino, Luca

AU - Yanagisawa, Yoshihiko

AU - Ishikawa, Mizue

AU - Matsumoto, Takuya

AU - Tanaka, Hidekazu

AU - Kawai, Tomoji

PY - 2006/12/4

Y1 - 2006/12/4

N2 - A novel method to fabricate (Fe,Mn)3O4 (FMO) thin-film epitaxial nanostructures employing atomic force microscopy (AFM)-fabricated Mo/poly(methyl methacrylate) (PMMA) nanomasks and wet chemical etching, is discussed. Nanomasks were realized by combining local anodic oxidation (LAO) of Mo and dry etching of PMMA. Nanostructures with dimensions of 100 nm can be easily fabricated with this technique, and the nanomask can be removed by ultrasonication in acetone. FMO nanochannels show transport properties similar to those of films, which exhibit room-temperature ferromagnetism and present the possibility of fabricating spin-polarized nanometer-scale circuits for spintronics. Nanogap electrodes can be fabricated on prepared nanochannels by Mo/PMMA masks using lift-off procedures, or the magnitude nanochannels themselves can be realized by wet etching through Mo/PMMA masks realized on metallic nanogap-electrode templates.

AB - A novel method to fabricate (Fe,Mn)3O4 (FMO) thin-film epitaxial nanostructures employing atomic force microscopy (AFM)-fabricated Mo/poly(methyl methacrylate) (PMMA) nanomasks and wet chemical etching, is discussed. Nanomasks were realized by combining local anodic oxidation (LAO) of Mo and dry etching of PMMA. Nanostructures with dimensions of 100 nm can be easily fabricated with this technique, and the nanomask can be removed by ultrasonication in acetone. FMO nanochannels show transport properties similar to those of films, which exhibit room-temperature ferromagnetism and present the possibility of fabricating spin-polarized nanometer-scale circuits for spintronics. Nanogap electrodes can be fabricated on prepared nanochannels by Mo/PMMA masks using lift-off procedures, or the magnitude nanochannels themselves can be realized by wet etching through Mo/PMMA masks realized on metallic nanogap-electrode templates.

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U2 - 10.1002/adma.200600997

DO - 10.1002/adma.200600997

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SN - 0935-9648

VL - 18

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JO - Advanced Materials

JF - Advanced Materials

IS - 23

ER -

(Fe,Mn)₃O₄ nanochannels fabricated by AFM local-oxidation nanolithography using Mo/poly(methyl methacrylate) nanomasks

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