Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO2 prepared with Ar/H2 plasma surface treatment

Takuma Nakano; Shota Yazawa; Shota Araki; Sumio Kogoshi; Noboru Katayama; Yusuke Kudo; Tetsuya Nakanishi

doi:10.7567/JJAP.54.01AE04

Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO₂ prepared with Ar/H₂ plasma surface treatment

Takuma Nakano, Shota Yazawa, Shota Araki, Sumio Kogoshi, Noboru Katayama, Yusuke Kudo, Tetsuya Nakanishi

College of Industrial Technology

Research output: Contribution to journal › Article › peer-review

6 Citations (Scopus)

Abstract

Oxygen-deficient TiO₂ (TiO_2-x) has been proposed as a visible-light-responsive photocatalyst. TiO₂%x thin films were prepared by Ar/H₂ plasma surface treatment, applying varying levels of microwave input power and processing times. The highest visible light photocatalytic activity was observed when using an input power of 200W, a plasma processing time of 10min, and a 1 : 1 Ar : H₂ ratio, conditions that generate an electron temperature of 5.7(±1.0) eV and an electron density of 8.5 × 10¹⁰cm^-3. The maximum formaldehyde (HCHO) removal rate of the TiO₂%x film was 2.6 times higher than that obtained from a TiO_2-xN_x film under the same test conditions.

Original language	English
Article number	01AE04
Journal	Japanese Journal of Applied Physics
Volume	54
Issue number	1 Supplement
DOIs	https://doi.org/10.7567/JJAP.54.01AE04
Publication status	Published - 1 Jan 2015

Access to Document

10.7567/JJAP.54.01AE04

Cite this

@article{c6574d20991e45c5baaba1e1564aea8f,

title = "Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO2 prepared with Ar/H2 plasma surface treatment",

abstract = "Oxygen-deficient TiO2 (TiO2-x) has been proposed as a visible-light-responsive photocatalyst. TiO2%x thin films were prepared by Ar/H2 plasma surface treatment, applying varying levels of microwave input power and processing times. The highest visible light photocatalytic activity was observed when using an input power of 200W, a plasma processing time of 10min, and a 1 : 1 Ar : H2 ratio, conditions that generate an electron temperature of 5.7(±1.0) eV and an electron density of 8.5 × 1010cm-3. The maximum formaldehyde (HCHO) removal rate of the TiO2%x film was 2.6 times higher than that obtained from a TiO2-xNx film under the same test conditions.",

author = "Takuma Nakano and Shota Yazawa and Shota Araki and Sumio Kogoshi and Noboru Katayama and Yusuke Kudo and Tetsuya Nakanishi",

note = "Publisher Copyright: {\textcopyright} 2015 The Japan Society of Applied Physics.",

year = "2015",

month = jan,

day = "1",

doi = "10.7567/JJAP.54.01AE04",

language = "English",

volume = "54",

journal = "Japanese Journal of Applied Physics",

issn = "0021-4922",

publisher = "Japan Society of Applied Physics",

number = "1 Supplement",

}

TY - JOUR

T1 - Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO2 prepared with Ar/H2 plasma surface treatment

AU - Nakano, Takuma

AU - Yazawa, Shota

AU - Araki, Shota

AU - Kogoshi, Sumio

AU - Katayama, Noboru

AU - Kudo, Yusuke

AU - Nakanishi, Tetsuya

PY - 2015/1/1

Y1 - 2015/1/1

N2 - Oxygen-deficient TiO2 (TiO2-x) has been proposed as a visible-light-responsive photocatalyst. TiO2%x thin films were prepared by Ar/H2 plasma surface treatment, applying varying levels of microwave input power and processing times. The highest visible light photocatalytic activity was observed when using an input power of 200W, a plasma processing time of 10min, and a 1 : 1 Ar : H2 ratio, conditions that generate an electron temperature of 5.7(±1.0) eV and an electron density of 8.5 × 1010cm-3. The maximum formaldehyde (HCHO) removal rate of the TiO2%x film was 2.6 times higher than that obtained from a TiO2-xNx film under the same test conditions.

AB - Oxygen-deficient TiO2 (TiO2-x) has been proposed as a visible-light-responsive photocatalyst. TiO2%x thin films were prepared by Ar/H2 plasma surface treatment, applying varying levels of microwave input power and processing times. The highest visible light photocatalytic activity was observed when using an input power of 200W, a plasma processing time of 10min, and a 1 : 1 Ar : H2 ratio, conditions that generate an electron temperature of 5.7(±1.0) eV and an electron density of 8.5 × 1010cm-3. The maximum formaldehyde (HCHO) removal rate of the TiO2%x film was 2.6 times higher than that obtained from a TiO2-xNx film under the same test conditions.

UR - http://www.scopus.com/inward/record.url?scp=84920489694&partnerID=8YFLogxK

U2 - 10.7567/JJAP.54.01AE04

DO - 10.7567/JJAP.54.01AE04

M3 - Article

AN - SCOPUS:84920489694

SN - 0021-4922

VL - 54

JO - Japanese Journal of Applied Physics

JF - Japanese Journal of Applied Physics

IS - 1 Supplement

M1 - 01AE04

ER -

Experimental study of the visible-light photocatalytic activity of oxygen-deficient TiO₂ prepared with Ar/H₂ plasma surface treatment

Abstract

Access to Document

Other files and links

Fingerprint

Cite this