Evaluation of BAW and SAW Properties of (K, Na)NbO3Thin Films Deposited by RF Sputtering

Kazuma Yoshizawa, Masashi Suzuki, Shoji Kakio, Yoshiharu Ito, Akinori Tateyama, Hiroshi Funakubo, Tsuyoshi Wakabayashi, Kenji Shibata

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